We propose using Intel Pentium Pro workstations in a NOW configuration to break the classical barriers in EUV simulation and provide Web-based viewing of results from remote locations. Specifically, we will demonstrate, for the first time, the solution of scattering from regions ten thousand cubic wavelengths in size as encountered in lithography, essential for the growing need for sub-micron features in Si wafers.
Plasma Processing Simulation for Accelerating Design of Semiconductor Manufacturing Equipment We will advance state-of-the-art of plasma processing simulation, delivering a tool which can simulate supercomputer level problems on an affordable NOW configuration, enabling engineers (e.g. Lam Research, Applied Materials, and indirectly the semiconductor manufacturers such as Intel) to design, analyze and optimize present and future semiconductor processing equipment. Both this project and the last one will run on a group NOW, and next generation problems will require the campus NOW.
The proposed research on lithography and plasma simulation has direct implications for industry, and Intel, in particular. Our proposed lithography work will be essential for the growing need for sub-micron features in Si wafers. Our work on plasma processing simulation will enable engineers to design, analyze and optimize present and future semiconductor processing equipment.
All of the proposed research topics involve computationally intensive components. The proposed Intel contribution will enable us to experiment with conducting these computations on clusters of workstations rather than more traditional sources of high-end computing. In addition, our interactions with Digital Library research is likely to lead to new applications. For these to be available to a large number of individuals outside of academia, we will need to develop them for commonly available platforms, a process which the proposed grant will accelerate.
February 1999